포항공대 EESL Fearless challenge

Facile process to clean PMMA residue on graphene using KrF laser annealing

Journal

AIP Advances

Vol

8(10)

Page

p.105326

Author

H.J. Hwang, Y.S. Lee, C. Cho, B.H. Lee

Year

2018

Date

2018.08.25

doi

https://doi.org/10.1063/1.5051671

File

AIP-advances_2018.pdf (4.2M) 1회 다운로드 DATE : 2021-03-31 14:45:25

Link

https://doi.org/10.1063/1.5051671 252회 연결