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Total 5건 1 페이지

1998
5

International
"Effect of Barrier layer on the Electrical and Reliability Characteristics of High-k gate dielectric films" Y. Jeon, B. H. Lee, K. Zawadzki, W.Qi, A. Lucas, R. Nieh and J. Lee, Tech. Dig. of Int. Electron Device Meetings, 1998.

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4

International
"Comparative study of TiO2 and Ta2O5 on JVD nitride as an alternative gate dielectrics" B. H. Lee, Y. Jeon, A. Lucas, M. Gilmer, M. Gardner, J. Fair and J. C. Lee, Proceedings of 29th IEEE SISC, 1998.
3

International
"Leakage characteristics of TiO2 films" B.H. Lee, Y. Jeon, K. Zawadzki, W.-J. Qi, R. Nieh, A. Lucas and J. Lee, Proceedings of American Vacuum Society Symposium, 1998.
2

International
"Sputtered BST Thin Films for Alternative High K Gate Dielectrics" K. Zawadzki, W.-J. Qi, Y. Jeon, B. H. Lee, A. Lucas, R. Nieh, and J. Lee, Proceedings of American Vacuum Society Symposium, 1998.
1

International
"Alternative Gate Dielectric with BST/TiO2(Barrier Layer) Stacked Structure" Y. Jeon, K. Zawadzki, B. H. Lee, V. Balu, and J.C. Lee, MRS Symposium on Rapid thermal and Integrated processing VII, 1998.

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