Process dependent transient charge trapping behaviors in HfSiO dielectric devices
- Conference
- Proc. of ALD conference
- Author
- R. Choi, C.Y. Kang, S. Krishnan, G. Bersuker, C. Young, D. Heh, P. Kirsch, and B. H. Lee
- Year
- 2006
- Date
- 2006
- 학회구분
-
International
R. Choi, C.Y. Kang, S. Krishnan, G. Bersuker, C. Young, D. Heh, P. Kirsch, and B. H. Lee, “Process dependent transient charge trapping behaviors in HfSiO dielectric devices”, Proc. of ALD conference, (2006).
