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    • Thermally Stable N-Metal Gate MOSFETs Using La-Incorporated HfSiO Dielectric
    Conference
    Proc. of Symp. on VLSI Tech., p.16
    Author
    H.N. Alshareef , H.R. Harris, H.C. Wen, C.S. Park, C. Huffman, K. Choi, H.F. Luan, P. Majhi, B. H. Lee and R. Jammy, D.J. Lichtenwalner, J.S. Jur, and A. I. Kingon
    Year
    2006
    Date
    2006
    학회구분
    International
    File
    2006_VLSI_HNALSHAREEF.pdf (480.1K) 0회 다운로드 DATE : 2021-04-02 12:44:26


    H.N. Alshareef , H.R. Harris, H.C. Wen, C.S. Park, C. Huffman, K. Choi, H.F. Luan, P. Majhi, B. H. Lee and R. Jammy, D.J. Lichtenwalner, J.S. Jur, and A. I. Kingon, “Thermally Stable N-Metal Gate MOSFETs Using La-Incorporated HfSiO Dielectric”, Proc. of Symp. on VLSI Tech., p.16, (2006).