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    • An accurate lifetime analysis methodology incorporating governing NBTI mechanisms in high-k/SiO2 gate stacks
    Conference
    IEDM
    Author
    A. Neugroschel, G. Bersuker, R. Choi, C. Cochrane, P. Lenahan, D. Heh, C. Young, C.Y. Kang, B. H. Lee, R. Jammy
    Year
    2006
    Date
    2006
    학회구분
    International
    File
    2006_IEDM_ANEUGROSCHEL.pdf (313.1K) 0회 다운로드 DATE : 2021-04-02 13:00:54

    A. Neugroschel, G. Bersuker, R. Choi, C. Cochrane, P. Lenahan, D. Heh, C. Young, C.Y. Kang, B. H. Lee, R. Jammy, “An accurate lifetime analysis methodology incorporating governing NBTI mechanisms in high-k/SiO2 gate stacks”, IEDM, (2006).