목록 게시판 리스트 옵션 검색 A novel in situ plasma treatment for damage-free metal/high-k gate stack RIE proces Conference IEDM Author B.S.Ju, S.C.Song, T.H.Lee, B.Sassman, C.Y.Kang, B. H. Lee, R.Jammy Year 2006 Date 2006 학회구분 International File 2006_IEDM_BSJU.pdf (1.0M) 0회 다운로드 DATE : 2021-04-02 13:02:24 B.S.Ju, S.C.Song, T.H.Lee, B.Sassman, C.Y.Kang, B. H. Lee, R.Jammy, “A novel in situ plasma treatment for damage-free metal/high-k gate stack RIE proces”, IEDM, (2006).
