Characteristics of Very Low Temperature ALD Al2O3 Gate Dielectric for Top Gate Graphene MOSFET Applications
Conference
Ext. Abs. of Int. Workshop on Dielectric Thin Film (IWDTF)
Author
Y.G. Lee, C.G. Kang, S.K. Lee, K.J. Choi, C.H. Cho, H.J. Hwang, S.Y. Lee, S.K. Lim, U.J. Jung, and B.H. Lee
Year
2011
Date
2011
학회구분
International
File
2011_IWDTF_YGLEE.pdf (234.8K) 0회 다운로드 DATE : 2021-04-02 14:19:46