목록 Characteristics of Very Low Temperature ALD Al2O3 Gate Dielectric for Top Gate Graphene MOSFET Applications Conference Ext. Abs. of Int. Workshop on Dielectric Thin Film (IWDTF) Author Y.G. Lee, C.G. Kang, S.K. Lee, K.J. Choi, C.H. Cho, H.J. Hwang, S.Y. Lee, S.K. Lim, U.J. Jung, and B.H. Lee Year 2011 Date 2011 학회구분 International File 2011_IWDTF_YGLEE.pdf (234.8K) 0회 다운로드 DATE : 2021-04-02 14:19:46