Effects of Hf and Zr implanted into Si substrates on the electrical properties of MOS devices
- Conference
- AIP conference
- Author
- C.S. Kang, L.Kang, B. H. Lee, Y. Jeon, W. Qi, R. Nieh, K.Onishi, S. Gopalan, R. Choi, E. Dharmarajan, and J. C. Lee
- Year
- 2001
- Date
- 2001
- 학회구분
-
International
