W/HfO2 gate stacks with Tinv~1.2nm and low charge trapping
- Conference
- Ext. Abs. of SSDM
- Author
- Callegari, P.Jamison, B. H. Lee, D.Neumayer, V.Narayanan, S.Zafar, E.Gusev, C.D’Emic, D.Lacey, M.Gribelyuk, C.Cabral, A.Steegen, V.Ku, R.Amos, Y.Li, P.Nguyen, F.McFeely, G.Singer, J.Cai, S.-H.Ku, Y.Y.Wang, C.Wajda, D.O’Meam, H.Shinriki, and T.Takahashi
- Year
- 2003
- Date
- 2003
- 학회구분
-
International
