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    • Atomic Layer Deposition of High k Dielectric and Metal Gate Stacks for MOS Devices
    Conference
    Characterization and Metrology for ULSI technology
    Author
    Y. Senzaki, K. Choi, P.D. Kirsch, P. Majhi, and B.H. Lee
    Year
    2005
    Date
    2005, invited
    학회구분
    International

    Y. Senzaki, K.Choi, P. D. Kirsch, P. Majhi, and B. H. Lee, “Atomic Layer Deposition of High k Dielectric and Metal Gate Stacks for MOS Devices”, Characterization and Metrology for ULSI technology, (2005), Invited.