Hot carrier and cold carrier studies during stress in Hf-silciate NMOS transistors with Poly and TiN gate stack
- Year
- 2005
- Date
- 2005
- 학회구분
- International
J. H. Sim, B. H. Lee, S. C. Song, C. D. Young a, R. Choi, H. Rusty Harris and G. Bersuker, “Hot carrier and cold carrier studies during stress in Hf-silciate NMOS transistors with Poly and TiN gate stack”, Proc. of IRPS, p.638, (2005).