Hot carrier and cold carrier studies during stress in Hf-silciate NMOS transistors with Poly and TiN gate stack
Conference
Proc. of IRPS
Author
J.H. Sim, B.H. Lee, S.C. Song, C.D. Young a, R. Choi, H. Rusty Harris, G. Bersuker
Year
2005
Date
2005
학회구분
International

J. H. Sim, B. H. Lee, S. C. Song, C. D. Young a, R. Choi, H. Rusty Harris and G. Bersuker, “Hot carrier and cold carrier studies during stress in Hf-silciate NMOS transistors with Poly and TiN gate stack”, Proc. of IRPS, p.638, (2005).