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    • Work function engineering of RuHf alloys as gate electrodes for future generation dual metal CMOS
    Conference
    Proc. of VLSI-TSA
    Author
    H.C. Wen, P. Majhi, H. Alshareef, C. Huffman, K. Choi, P. Lysaght, R. Harris, H. Luand, B. H. Lee
    Year
    2005
    Date
    2005
    학회구분
    International
    File
    2005_VLSITSA_HCWEN.pdf (366.5K) 0회 다운로드 DATE : 2021-04-03 21:28:50

    H.C. Wen, P. Majhi, H. Alshareef, C. Huffman, K. Choi, P. Lysaght, R. Harris, H. Luand, and B. H. Lee, “Work function engineering of RuHf alloys as gate electrodes for future generation dual metal CMOS”, Proc. of VLSI-TSA, p.107, (2005).