Cold and Hot Carrier effects on HfO2 and HfSiO NMOSFETS with TiN gate electrode
Conference
Proc. of DRC
Author
J.H. Sim, S.C. Song, R. Choi, C.D. Young, G. Bersuker, S.H. Bae, D.L. Kwong, B. H. Lee
Year
2005
Date
2005
학회구분
International
File
2005_DRC_JHSIM.pdf (1.0M) 0회 다운로드 DATE : 2021-04-03 21:29:32

J.H. Sim, S.C. Song, R. Choi, C.D. Young, G. Bersuker, S.H. Bae, D.L. Kwong and B. H. Lee, “Cold and Hot Carrier effects on HfO2 and HfSiO NMOSFETS with TiN gate electrode”, Proc. of DRC, (2005).