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    • Effects of TiN Overlayer on ALD TaCN Metal Gate/High-k MOSFET Characteristics
    Conference
    Proc. of DRC
    Author
    Z.B. Zhang, S.C. Song, K. Choi, J.H. Sim, P. Majhi, B.H. Lee
    Year
    2005
    Date
    2005
    학회구분
    International
    File
    2005_DRC_ZBZHANG.pdf (876.0K) 0회 다운로드 DATE : 2021-04-03 21:30:13

    Z.B. Zhang, S.C. Song, K. Choi, J.H. Sim, P. Majhi, B. H. Lee, “Effects of TiN Overlayer on ALD TaCN Metal Gate/High-k MOSFET Characteristics”, Proc. of DRC, (2005).