Evaluation and Integration of Metal Gate Electrodes for Future Generation Dual Metal CMOS
- Year
- 2005
- Date
- 2005, invited
- 학회구분
- International
- File
- 2005_ICICDT_PMAJHI.pdf (649.4K) 0회 다운로드 DATE : 2021-04-03 21:32:31
P. Majhi, H.C. Wen, H. Alshareef, K. Choi, R. Harris, P. Lysaght, H. Luan, Y. Senzaki, S. C. Song, B. H. Lee, and C. Ramiller, “Evaluation and Integration of Metal Gate Electrodes for Future Generation Dual Metal CMOS”, Proc. of ICICDT, p.69, (2005), Invited.