Challenges in the High-k Dielectric Implementation for 45nm Technology Node
- Year
- 2005
- Date
- 2005, invited
- 학회구분
- International
B. H. Lee, S. C. Song, C.Young, P. Kirsch, R.Choi, P.Lysaght, P.Majhi, G.Bersuker and C.Ramiller, “Challenges in the High-k Dielectric Implementation for 45nm Technology Node”, Proc. of ICICDT, p.73, (2005), Invited.