Charge Trapping in n-MOSFETs with TiN/HfSixOy/SiO2/p-Si Gate Stack during Substrate Injection
- Year
- 2005
- Date
- 2005
- 학회구분
- International
P. Srinivasan , N. A. Chowdhury, A. Peralta, D. Misra, R.Choi and B. H. Lee, “Charge Trapping in n-MOSFETs with TiN/HfSixOy/SiO2/p-Si Gate Stack during Substrate Injection”, ECS spring, (2005).