Gate Work Function Modification Using Ultra-Thin Metal Interlayers
- Year
- 2005
- Date
- 2005
- 학회구분
- International
H.N. Alshareef, K. Choi, H.C. Wen, H. R. Harris, H. Luan, P. Lysaght, P. Majhi, and B. H. Lee, “Gate Work Function Modification Using Ultra-Thin Metal Interlayers”, ECS spring meeting, (2005).