Comparison of MOSFET characteristics between ALD and MOCVD TiN metal gate on Hf silicate
Conference
ECS spring meeting
Author
S.C. Song, B.H. Lee, Z. Zhang, K. Choi, S.H. Bae, H. Alshareef, P. Majhi, H.C. Wen, J. Bennett, B. Sassman, P. Zeitzoff
Year
2005
Date
2005
학회구분
International

S.C.Song, B. H. Lee, Z.Zhang, K.Choi, S.H Bae, H.Alshareef, P.Majhi, H.C.Wen, J.Bennett , B.Sassman, and P. Zeitzoff, “Comparison of MOSFET characteristics between ALD and MOCVD TiN metal gate on Hf silicate”, ECS spring meeting, (2005).