Mechanism of charge trapping reduction in scaled high-k gate stacks
Conference
NATO Workshop on defect in high-k dielectrics, St. Petersburg
Author
G. Bersuker, B.H. Lee, H. Huff
Year
2005
Date
2005, invited
학회구분
International
G. Bersuker, B. H. Lee, and H. Huff, “Mechanism of charge trapping reduction in scaled high-k gate stacks,” NATO Worksho”, NATO Workshop on defect in high-k dielectrics, St. Petersburg, (2005), Invited.
