Electrical Characterization Methodologies for Advanced Gate Stacks with Metal gate and High-k dielectrics
- Year
- 2005
- Date
- 2005, invited
- 학회구분
- International
B. H. Lee,, G. Bersuker, N. Moumen, P. Majhi, P. Kirsch, S.C. Song and C. Ramiller, “Electrical Characterization Methodologies for Advanced Gate Stacks with Metal gate and High-k dielectrics”, International Semiconductor Technology Conference, (2005), Invited.