High-k Dielectric Process Development for Enhanced Electron Mobility in High Performance Field Effect Transistors
- Year
- 2005
- Date
- 2005
- 학회구분
- International
- File
- 2005_ISTC_PDKIRSCH.pdf (1.1M) 0회 다운로드 DATE : 2021-04-03 21:43:09
P. D. Kirsch, J.J. Peterson, H.-J. Li, J. Gutt, S. Krishnan, M. Quevedo-Lopez, B. H. Lee, N. Moumen, J. Barnett, P. Majhi, S.C. Song and C. Ramiller, “High-k Dielectric Process Development for Enhanced Electron Mobility in High Performance Field Effect Transistors”, ISTC, (2005), Invited.