포항공대 EESL EESL Fearless challenge

전체메뉴

전체메뉴
CONTACT US
  • LOGIN
    • Systematic investigation of amorphous transition-metal-silicon-nitride electrodes for metal gate CMOS applications
    Conference
    Proc. of VLSI
    Author
    H.C. Wen, H.N. Alshareef, H. Luan, K. Choi, P. Lysaght, H.R. Harris, C. Huffman, G.A. Brown, G. Bersuker, P. Zeitzoff, H. Huff, P. Majhi, B.H. Lee
    Year
    2005
    Date
    2005
    학회구분
    International
    File
    2005_VLSI_HCWEN.pdf (569.9K) 0회 다운로드 DATE : 2021-04-03 21:45:05

    H.C.Wen, H.N. Alshareef, H.Luan, K. Choi, P. Lysaght, H.R., Harris, C. Huffman, G.A. Brown, G. Bersuker, P. Zeitzoff, H. Huff, P. Majhi, B. H. Lee, “Systematic investigation of amorphous transition-metal-silicon-nitride electrodes for metal gate CMOS applications”, Proc. of VLSI, p.46, (2005).