포항공대 EESL Fearless challenge

A study on the atomic layer deposited tin oxide channel for thin film transistor

Conference

NANO KOREA

Author

H.W.Lee, S.Y.Kim, S.M.Kim, H.I.Lee, Y.S.Lee, H.J.Hwang and B.H.Lee*

Year

2020

Date

2020

학회구분

International

File

nanokorea2020_이해원.pdf (234.7K) 1회 다운로드 DATE : 2021-04-04 14:13:16