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    • ALD of Advanced High-k dielectric and Metal Gate Stacks for MOS Devices
    Conference
    AIP Conf. Proc. 788, characterization and metrology for ULSI technology
    Author
    Y. Senzaki, J. Gutt, G. Brown, P. Kirsch, H. Alshareef, K. Choi, H. Wen, P. Majhi, B.H. Lee
    Year
    2005
    Date
    2005, invited
    학회구분
    International

    Y. Senzaki, J. Gutt, G. Brown, P. Kirsch, H. Alshareef, K. Choi, H. Wen, P. Majhi and B. H. Lee, “ALD of Advanced High-k dielectric and Metal Gate Stacks for MOS Devices”, AIP Conf. Proc. 788, characterization and metrology for ULSI technology, p.69, (2005), Invited.