목록 게시판 리스트 옵션 검색 Single-layer thin HfO2 gate dieletric with n+-polysilicon gate Conference Proc. of Symposium on VLSI technology Author L. Kang, Y. Jeon, K. Onishi, B. H. Lee, W. Qi, R. Nieh, S. Gopalan, and J.C. Lee Year 2000 Date 2000 학회구분 International File 2000_Sym.VLSI.Tech_L.Kang.pdf (235.6K) 0회 다운로드 DATE : 2021-04-01 17:00:11
