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    • NBTI Dependence on Dielectric Thickness in Ultra-scaled HfSiO Dielectric/ ALD-TiN Gate Stacks
    Conference
    Ext. Abs. of Symp. on Solid State Device and Materials
    Author
    S.A. Krishnan, M. Quevedo, R. Harris, P.D. Kirsch, R. Choi, B.H. Lee, G. Bersuker, J. Peterson, H-J. Li, C. Young, J.C. Lee
    Year
    2005
    Date
    2005
    학회구분
    International

    S.A. Krishnan, M. Quevedo, R. Harris, P. D. Kirsch, R. Choi, B. H. Lee, G. Bersuker, J. Peterson, H-J. Li, C. Young and J.C. Lee, “NBTI Dependence on Dielectric Thickness in Ultra-scaled HfSiO Dielectric/ ALD-TiN Gate Stacks”, Ext. Abs. of Symp. on Solid State Device and Materials, (2005).