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    • Prospect of high-k/metal gate stack technology for future CMOS devices
    Conference
    5th int. Symp. on Physics and Chemistry of SiO2 and Si-SiO2 interface, ECS Meeting
    Author
    B.H. Lee, P. Kirsch, P. Majhi, S.C. Song, R. Choi, G. Bersuker
    Year
    2005
    Date
    2005, invited
    학회구분
    International

    B. H. Lee,, P. Kirsch, P. Majhi, S.C. Song, R. Choi and G. Bersuker , “Prospect of high-k/metal gate stack technology for future CMOS devices,” 5th int. Symp. on Physics and Chemistry of SiO2 and Si-SiO2 interface, ECS Meeting, (2005), Invited.