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    • Effects of ALD TiN Metal Gate Thickness on Metal Gate /High-k Dielectric SOI FinFET Characteristics
    Conference
    IEEE SOI Conference
    Author
    C.Y. Kang, R. Choi, S.C. Song, B.S. Ju, M.M. Hussain, B.H. Lee, J-W. Yang, D. Pham, H-H. Tseng
    Year
    2005
    Date
    2006
    학회구분
    International
    File
    2006_IEEE-SOI_CYKANG.pdf (2.4M) 0회 다운로드 DATE : 2021-04-04 16:40:49

    C. Y. Kang, R. Choi, S. C. Song, B. S. Ju, M. M. Hussain, B. H. Lee, J-W. Yang, D. Pham, H-H Tseng, “Effects of ALD TiN Metal Gate Thickness on Metal Gate /High-k Dielectric SOI FinFET Characteristics”, IEEE SOI Conference, (2006).