포항공대 EESL EESL Fearless challenge

전체메뉴

전체메뉴
CONTACT US
  • LOGIN
    • An Integrable Dual Metal Gate/High-k CMOS Solution for FD-SOI and MuGFET Technologies
    Conference
    Proc. of IEEE SOI conf.
    Author
    Z. Zhang, S.C. Song, K. Choi, J.H. Sim, P. Majhi, B.H. Lee
    Year
    2005
    Date
    2005
    학회구분
    International

    Z. Zhang, S.C. Song, K. Choi, J.H. Sim, P. Majhi, and B. H. Lee, “An Integrable Dual Metal Gate/High-k CMOS Solution for FD-SOI and MuGFET Technologies”, Proc. of IEEE SOI conf., (2005).