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    • Material Characterization of TEMAHf and HfCl4 HfO2 ALD to Enable Dielectric Scaling, Improved Electron Mobility and Vth Stability
    Conference
    AVS ALD symposium
    Author
    P.D. Kirsch, H.-J. Li, J. Peterson, M. Quevedoc, Y. Senzaki, N. Moumen, S.C. Song, B.H. Lee
    Year
    2005
    Date
    2005
    학회구분
    International

    P. D. Kirsch, H.-J. Li, J. Peterson, M. Quevedoc, Y. Senzaki, N. Moumen, S. C. Song and B. H. Lee, “Material Characterization of TEMAHf and HfCl4 HfO2 ALD to Enable Dielectric Scaling, Improved Electron Mobility and Vth Stability”, AVS ALD symposium, (2005).