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    • Spectroscopic analysis of the process dependent microstructure of ultra-thin high-k gate dielectric film systems
    Conference
    5th International Symposium on Atomic Layer Characterization for New Materials and Devices
    Author
    P.S. Lysaght, J. Barnett, B. Foran, M. Quevedo, P. Kirsch, G. Bersuker, M. Gardner, B.H. Lee, L. Larson
    Year
    2005
    Date
    2005
    학회구분
    International
    File
    2005_ISALCNMD_PSLYSAGHT.pdf (519.7K) 0회 다운로드 DATE : 2021-04-04 17:10:28

    P. S. Lysaght, J. Barnett, B. Foran, M. Quevedo, P.Kirsch, G.Bersuker, M.Gardner, B. H. Lee and L. Larson, “Spectroscopic analysis of the process dependent microstructure of ultra-thin high-k gate dielectric film systems”, 5th International Symposium on Atomic Layer Characterization for New Materials and Devices, (2005).