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    • Fast relaxation behavior and its implication on the measurement in high-k gate dielectric
    Conference
    SISC
    Author
    R. Choi, B.H. Lee, K. Mathur, C.D. Young, G. Bersuker, Y. Zhao
    Year
    2005
    Date
    2005
    학회구분
    International

    R. Choi, B. H. Lee, K. Mathur, C.D. Young, G. Bersuker, Y. Zhao , “Fast relaxation behavior and its implication on the measurement in high-k gate dielectric”, SISC, (2005).