High-K Gate Dielectrics: ZrO2, HfO2, and Their Silicates
- Conference
- ECS symposium on Gate Stacks for Nanoscale CMOS I
- Author
- J.C. Lee, R. Nieh, B. H. Lee, L. Kang, K. Onishi, Y. Jeon, E. Dharmarjan, S. Gopalan, C.S. Kang, and R. Choi
- Year
- 2001
- Date
- 2001, invited
- 학회구분
-
International
