포항공대 EESL Fearless challenge

Impact of the bottom interfacial layer on the threshold voltage and device reliability of fluorine incorporated PMOSFET with high-k/metal electrode

Conference

IRPS

Author

K. Choi, T. Lee, S. Kwon, C. D. Young, H. R. Harris, H.C. Wen, M. Q. Lopeza, H. Park, N. Hiro, C. S. Park, R. Choi, S.C. Song, B. H. Lee, and R. Jammy

Year

2007

Date

2007

학회구분

International

File

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