Smart” TDDB Algorithm for Investigating Degradation in High-k Gate Dielectric Stacks under Constant Voltage Stress
Conference
4th Int. Symp. on Adv. Gate Stack Tec
Author
C. Young, G. Bersuker, J. Tun, R. Choi, D. Heh, and B. H. Lee
Year
2007
Date
2007
학회구분
International
File
2007_ISAGST_CYOUNG.pdf (459.4K) 0회 다운로드 DATE : 2021-04-05 01:35:21