목록 게시판 리스트 옵션 검색 Smart” TDDB Algorithm for Investigating Degradation in High-k Gate Dielectric Stacks under Constant Voltage Stress Conference 4th Int. Symp. on Adv. Gate Stack Tec Author C. Young, G. Bersuker, J. Tun, R. Choi, D. Heh, and B. H. Lee Year 2007 Date 2007 학회구분 International File 2007_ISAGST_CYOUNG.pdf (459.4K) 0회 다운로드 DATE : 2021-04-05 01:35:21