목록 게시판 리스트 옵션 검색 Effect of Si cap layer on interface quality and NBTI in Ge-on-si with HfSiO for High Mobility Channel pMOSFETs Conference 4th Int. Symp. on Adv. Gate Stack Tech. Author O.S. Yoo, J.W. Oh, K.S. Min, C.Y. Kang, K.-T. Lee, M.K. Na, S.C. Song, R. Choi, B. H. Lee e, P. Majhi, H-H Tseng and H.-D. Lee Year 2007 Date 2007 학회구분 International File 2007_ISAGST_OSYOO.pdf (319.9K) 0회 다운로드 DATE : 2021-04-05 01:43:31
