목록 게시판 리스트 옵션 검색 Relaxation of FN stress induced Vth shift in nMOSFETs with HfSiON and TiN gate Conference Proc. of Device Research Conference Author R.Choi, B. H. Lee, J.H.Sim, G.Bersuker, L.Larson, J.C.Lee Year 2004 Date 2004 학회구분 International File 2004_DRC_R.Choi.pdf (147.2K) 0회 다운로드 DATE : 2021-04-05 01:51:57
