목록 게시판 리스트 옵션 검색 Comparative Study of Trapping Characteristics of HfSiON Dielectric in nMOSFETs with Poly-Si or TiN as Gate Electrode Conference Electronic Materials Conference Author D. C. Guo, L.Y. Song, X.W. Wang, T. P. Ma, B. H. Lee, S.Gopalan, R.Choi Year 2004 Date 2004 학회구분 International
