포항공대 EESL Fearless challenge

Effects of NH3 pre-anneal deposition on ALD high-k gate stacks

Conference

Electrochemical Society Symposium

Author

N. Moumen, J.J. Peterson, J. Barnett, B. H. Lee, J.H. Sim, R.W. Murto, G. Bersuker and H.R. Huff

Year

2004

Date

2004

학회구분

International

File

2004_ESS_N.Moumen.pdf (23.3K) 0회 다운로드 DATE : 2021-04-05 02:02:00