Effects of NH3 pre-anneal deposition on ALD high-k gate stacks
Conference
Electrochemical Society Symposium
Author
N. Moumen, J.J. Peterson, J. Barnett, B. H. Lee, J.H. Sim, R.W. Murto, G. Bersuker and H.R. Huff
Year
2004
Date
2004
학회구분
International
File
2004_ESS_N.Moumen.pdf (23.3K) 0회 다운로드 DATE : 2021-04-05 02:02:00