Electrical and Materials Characterization of Atomic Layer Deposited HfO2 Using Hf[N(CH3)C2H5]4 and O3 on HF Last Surface
- Conference
- 11th Workshop on oxide electronics
- Author
- P. D. Kirsch, J. Gutt, J. J. Peterson, S. Gopalan, S. Krishnan, H.-J. Li, P.Y. Hung, M. C. Chudzik, M. Gardner, B. H. Lee and H. R. Huff
- Year
- 2004
- Date
- 2004
- 학회구분
-
International
