포항공대 EESL Fearless challenge

Effects of drain to gate stress on NMOSFET with polysilicon/Hf-silicate gate stack

Conference

Integrated Rel. Workshop

Author

R. Choi, B. H. Lee, C. D. Young, J. H. Sim, K. Mathews, G. Bersuker, P. Zeitzoff

Year

2004

Date

2004

학회구분

International

File

2004_IRW_RCHOI.pdf (228.7K) 0회 다운로드 DATE : 2021-04-05 02:04:13