Thermally robust dual-work function ALD-MNx MOSFETs using conventional CMOS process flow
Conference
Symposium on VLSI Technology
Author
D.-G. Park, Z.J. Luo, N. Edleman, W. Zhu, P. Nguyen, K. Wong, C. Cabral, P. Jamison, B. H. Lee, A. Chou, M. Chudzik, J. Bruley, O. Gluschenkov, P. Ronsheim, A. Chakravarti, R. Mitchel, V. Ku, H. Kim, E. Duch, P. Kozlowski, C.D’Emic,V. Narayanan, A. Steege
