목록 게시판 리스트 옵션 검색 Physical Characteristics of HfO2 Dielectrics at the Physical Scaling Limit Conference Proc. of VLSI-TSA Author P. S. Lysaght, J. C. Woicik, M. A. Sahiner, P. D. Kirsch, G. Bersuker, B.-H. Lee and R. Jammy Year 2008 Date 2008 학회구분 International File 2008_VLSITSA_PSLYSAGHT.pdf (596.4K) 0회 다운로드 DATE : 2021-04-01 19:08:18
