목록 Plasma induced damage of aggressively scaled gate dielectric (EOT < 1.0 nm) in metal gate/high-k dielectric CMOSFETs Conference Proc. of IRPS Author K.S. Min, C.Y. Kang, O.S. Yoo, B.J. Park, S.W. Kim, C.D. Young, D. Heh, G. Bersuker, B.H. Lee, G.Y. Yeom Year 2008 Date 2008 학회구분 International File 2008_IRPS_KSMIN.pdf (140.3K) 0회 다운로드 DATE : 2021-04-01 19:12:00
