목록 게시판 리스트 옵션 검색 Reliability characterization of metal electrode/high-k dielectric stacks for 45nm node beyond Conference Proc. of IWDTF, Tokyo. Japan Author B.H.Lee, G. Bersuker, D. Heh, H. Park, C.Y. Kang, C. Young, H. Tseng Year 2008 Date 2008, Invited 학회구분 International
