목록 게시판 리스트 옵션 검색 Breakdown in the metal/high-k gate stack: Identifying the “weak link" in the multilayer dielectric Conference Proc. of Int. Electron Device Meeting, p.791 Author G. Bersuker, D. Heh, C. Young, H. Park, P. Khanal, L. Larcher, A. Padovani, P. Lenahan, J. Ryan, B. H. Lee, H. Tseng, R. Jammy Year 2008 Date 2008 학회구분 International File 2008_IEDM_GBERSUKER.pdf (354.9K) 0회 다운로드 DATE : 2021-04-01 19:25:22
